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TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography machine by the end of 2024, according to Japanese media outlet Nikkei Asia. Each High NA EUV machine costs over $350 million and will enable semiconductor makers to produce smaller chips…
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TSMC to receive first High NA EUV lithography machine by end of year
TechNode Feed
04:27
TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography machine by the end of 2024, according to Japanese media outlet Nikkei Asia. Each High NA EUV machine costs over $350 million and will enable semiconductor makers to produce smaller chips…
